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All-Region Statistical Model for Delay Variation Based on Log-Skew-Normal Distribution

机译:基于对数偏态正态分布的全地区时延变化统计模型

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摘要

In this paper, we propose a single probability density function for the distributions of the delay in the presence of the process variation for different regions of operation. The delay variation model is inspired by considering the analytical current models for each operating region. Based on these models, we suggest using the log-skew-normal distribution for modeling the delay variation for a wide range of supply voltages from the subthreshold to above-threshold regions. To assess the accuracy of the proposed delay distribution, the mean, standard deviation, skewness, 99th percentile, and yield of the proposed distribution are compared with those of the normal and log-normal distributions using the Monte Carlo (MC) simulations for different circuits in both bulk and FinFET technologies. The results show a higher accuracy for the proposed distribution in all regions of operation. Also, the proposed model enables us to obtain the 3σ yield of the distribution using up to 3.4 times less MC simulation time.
机译:在本文中,我们针对存在不同操作区域的过程变化,提出了一种用于延迟分布的单一概率密度函数。通过考虑每个工作区域的分析电流模型来激发延迟变化模型。基于这些模型,我们建议使用对数偏态正态分布来建模从亚阈值到阈值以上区域的宽范围电源电压的延迟变化。为了评估建议的延迟分布的准确性,使用蒙特卡罗(MC)模拟针对不同的电路,将建议的分布的平均值,标准偏差,偏度,第99个百分位数和良率与正态分布和对数正态分布的分布进行比较。在批量技术和FinFET技术中结果表明,在所有操作区域中,建议的分布都具有较高的准确性。此外,提出的模型使我们能够使用多达3.4倍的MC模拟时间获得3σ分布的收益。

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