A new InGaAs/InGaAsP delta -strained multiple-quantum-well laser grown by chemical-beam epitaxy

摘要

The authors propose and demonstrate a delta -strained multiple-quantum-well laser in which the quantum well is composed of a thin strained layer ( approximately AA In/sub x/Ga/sub 1-x/As) sandwiched by lattice-matched (In/sub 0.53/Ga/sub 0.47/As) layers. A threshold current density of 510 A/cm/sup 2 /was obtained from broad-area lasers with four delta -strained quantum wells and a cavity length of 3 mm, with an emission wavelength near 1.55 mu m. The use of a delta -strained quantum well provides an additional degree of freedom in optimizing the amount of strain and thickness of the active layer in improving the device performance.