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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >A three-layer 3D silicon system using through-Si vertical opticalinterconnections and Si CMOS hybrid building blocks
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A three-layer 3D silicon system using through-Si vertical opticalinterconnections and Si CMOS hybrid building blocks

机译:三层3D硅系统,使用直通硅垂直光学互连和Si CMOS混合构建模块

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We present for the first time a three-dimensional (3D) Si CMOSninterconnection system consisting of three layers of opticallyninterconnected hybrid integrated Si CMOS transceivers. The transceiversnwere fabricated using 0.8-Μm digital Si CMOS foundry circuits andnwere integrated with long wavelength InP-based emitters and detectorsnfor through-Si vertical optical interconnections. The opticalntransmitter operated with a digital input and optical output withnoperation speeds up to 155 Mb/s. The optical receiver operated with annexternal optical input and a digital output up to 155 Mb/s. Thentransceivers were stacked to form 3D through-Si vertical opticalninterconnections and a fabricated three layer stack demonstrated opticalninterconnections between the three layers with operational speed of 1nMb/s and bit-error rate of 10-9
机译:我们首次展示了一个三维(3D)Si CMOSn互连系统,该系统由三层光互连的混合集成Si CMOS收发器组成。收发器使用0.8-μm数字Si CMOS铸造电路制造,并与长波长基于InP的发射器和检测器集成在一起,以实现直通硅垂直光学互连。以数字输入和光输出操作的光发射器,操作速度高达155 Mb / s。该光接收机具有附件内部光输入和高达155 Mb / s的数字输出。然后将收发器堆叠起来以形成3D直通硅垂直光学互连,制造的三层堆叠展示了三层之间的光学互连,其工作速度为1nMb / s,误码率为10-9

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