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A three-layer 3-D silicon system using through-Si vertical optical interconnections and SiCMOS hybrid building blocks

机译:三层3-D硅系统,使用直通硅垂直光学互连和SiCMOS混合构造块

摘要

We present for the first time a three-dimensional (3-D) Si CMOS interconnection system consisting of three layers of optically interconnected hybrid integrated Si CMOS transceivers, The transceivers were fabricated using 0.8-mu m digital Si CMOS foundry circuits and were integrated with long wavelength InP-based emitters and detectors for through-Si vertical optical interconnections. The optical transmitter operated with a digital input and optical output with operation speeds up to 155 Mb/s, The optical receiver operated with an external optical input and a digital output up to 155 Mb/s. The transceivers were stacked to form 3-D through-Si vertical optical interconnections and a fabricated three-layer stack demonstrated optical interconnections between the three layers with operational speed of I Mb/s and bit-error rate of 10(-9)
机译:我们首次提出了一个三维(3-D)Si CMOS互连系统,该系统由三层光学互连的混合集成Si CMOS收发器组成。这些收发器使用0.8微米的数字Si CMOS铸造电路制造,并与用于Si垂直光学互连的长波长基于InP的发射器和检测器。光发送器以数字输入和光输出运行,最高运行速度为155 Mb / s。光接收器以外部光输入和数字输出运行,最高速度为155 Mb / s。收发器堆叠在一起以形成3-D直通硅垂直光学互连,制造的三层堆叠展示了三层之间的光学互连,工作速度为1 Mb / s,误码率为10(-9)

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