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首页> 外文期刊>Selected Topics in Quantum Electronics, IEEE Journal of >Tailoring GaAs, InAs, and InGaAs Nanowires for Optoelectronic Device Applications
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Tailoring GaAs, InAs, and InGaAs Nanowires for Optoelectronic Device Applications

机译:为光电设备应用量身定制GaAs,InAs和InGaAs纳米线

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摘要

GaAs, InAs, and InGaAs nanowires each exhibit significant potential to drive new applications in electronic and optoelectronic devices. Nevertheless, the development of these devices depends on our ability to fabricate these nanowires with tight control over critical properties, such as nanowire morphology, orientation, crystal structure, and chemical composition. Although GaAs and InAs are related material systems, GaAs and InAs nanowires exhibit very different growth behaviors. An understanding of these growth behaviors is imperative if high-quality ternary InGaAs nanowires are to be realized. This report examines GaAs, InAs, and InGaAs nanowires, and how their growth may be tailored to achieve desirable material properties. GaAs and InAs nanowire growth are compared, with a view toward the growth of high-quality InGaAs nanowires with device-accessible properties.
机译:GaAs,InAs和InGaAs纳米线各自具有显着的潜力,可推动电子和光电设备中的新应用。尽管如此,这些设备的开发取决于我们在严格控制关键特性(例如纳米线的形态,取向,晶体结构和化学成分)的情况下制造这些纳米线的能力。尽管GaAs和InAs是相关的材料系统,但是GaAs和InAs纳米线表现出非常不同的生长行为。如果要实现高质量的三元InGaAs纳米线,必须了解这些生长行为。该报告研究了GaAs,InAs和InGaAs纳米线,以及如何调整其生长以实现所需的材料性能。比较了GaAs和InAs纳米线的生长情况,以期获得具有器件可访问特性的高质量InGaAs纳米线。

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