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Bipolar Effects in Photovoltage of Metamorphic InAs/InGaAs/GaAs Quantum Dot Heterostructures: Characterization and Design Solutions for Light-Sensitive Devices

机译:变质InAs / InGaAs / GaAs量子点异质结构光电压中的双极效应:光敏器件的表征和设计解决方案

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摘要

The bipolar effect of GaAs substrate and nearby layers on photovoltage of vertical metamorphic InAs/InGaAs in comparison with pseudomorphic (conventional) InAs/GaAs quantum dot (QD) structures were studied. Both metamorphic and pseudomorphic structures were grown by molecular beam epitaxy, using bottom contacts at either the grown n +-buffers or the GaAs substrate. The features related to QDs, wetting layers, and buffers have been identified in the photoelectric spectra of both the buffer-contacted structures, whereas the spectra of substrate-contacted samples showed the additional onset attributed to EL2 defect centers. The substrate-contacted samples demonstrated bipolar photovoltage; this was suggested to take place as a result of the competition between components related to QDs and their cladding layers with the substrate-related defects and deepest grown layer. No direct substrate effects were found in the spectra of the buffer-contacted structures. However, a notable negative influence of the n +-GaAs buffer layer on the photovoltage and photoconductivity signal was observed in the InAs/InGaAs structure. Analyzing the obtained results and the performed calculations, we have been able to provide insights on the design of metamorphic QD structures, which can be useful for the development of novel efficient photonic devices.
机译:与伪变形(常规)InAs / GaAs量子点(QD)结构相比,研究了GaAs衬底及其附近层对垂直变质InAs / InGaAs的光电压的双极效应。通过分子束外延,利用生长的n + -缓冲液或GaAs底物的底部接触,生长了变质和假晶结构。与QD,润湿层和缓冲液有关的特征已在两种缓冲液接触结构的光电光谱中确定,而与基材接触的样品的光谱显示归因于EL2缺陷中心的其他起始点。接触基材的样品显示出双极性光电压;这被认为是由于与量子点相关的组件及其覆层与基材相关的缺陷和生长最深的层之间竞争的结果。在缓冲液接触结构的光谱中未发现直接的底物效应。然而,在InAs / InGaAs结构中,观察到n + -GaAs缓冲层对光电压和光电导信号的显着负面影响。分析获得的结果和进行的计算,我们已经能够提供有关变质QD结构设计的见解,这对开发新型高效光子器件很有用。

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