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Rate Equations for 1.3-$mu$ m Dots-Under-a-Well and Dots-in-a-Well Self-Assembled InAs–GaAs Quantum-Dot Lasers

机译:自组装InAs-GaAs量子点激光器的1.3-μμm孔以下点和孔中点的速率方程

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摘要

A rate-equation model, in which three discrete quantum-dot (QD) energy levels are assumed and all possible relaxation paths and carrier transport in the GaAs barrier are considered, is presented to analyze the steady-state performance of 1.3 mum undoped and doped dots-under-a-well (DUW) and dots-in-a-well (DWELL) InAs-GaAs QD lasers. DWELL QD lasers have higher saturation value of QD level occupation probabilities and characteristic temperature (T0) than that of DUW QD lasers due to the improvement of hole confinement. The p-doped QD laser shows lower threshold current density than n-doped QD laser at the same threshold condition, and the T0 of n-doped DWELL laser is higher than that of p-doped DWELL laser at room temperature. Optimized QD layer number of DUW and DWELL QD lasers with different QD density is discussed
机译:提出了一种速率方程模型,该模型假设了三个离散量子点(QD)能量水平,并考虑了GaAs势垒中所有可能的弛豫路径和载流子传输,以分析1.3微米未掺杂和掺杂的稳态性能InAs-GaAs QD激光器的孔下点(DUW)和孔下点(DWELL)。由于孔限制的改善,DWELL QD激光器比DUW QD激光器具有更高的QD级占据概率和特征温度(T0)饱和值。在相同阈值条件下,p掺杂QD激光器的阈值电流密度低于n掺杂QD激光器,并且在室温下,n掺杂DWELL激光器的T0高于p掺杂DWELL激光器。讨论了不同QD密度的DUW和DWELL QD激光器的优化QD层数

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