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首页> 外文期刊>IEEE Transactions on Electron Devices >Two-dimensional simulation of submicrometer GaAs MESFETs: surface effects and optimization of recessed gate structures
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Two-dimensional simulation of submicrometer GaAs MESFETs: surface effects and optimization of recessed gate structures

机译:亚微米GaAs MESFET的二维仿真:表面效应和嵌入式栅结构的优化

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摘要

The surface potential effect in GaAs MESFETs causes a depleted zone to form not only between the source and gate, but also between the gate and drain. The consequences of this phenomenon on the device behavior, the DC and AC characteristics, and the expected performance are studied. For this purpose, a two-dimensional resolution of the basic semiconductor equations is used. This model takes into account relaxation effects by including an energy relaxation equation. The dependence of MESFET characteristics such as transconductance, output conductance, and capacitance on the dimensions of the zone where surface potential effects occur is given. Some interesting conclusions concerning the optimization of recessed-gate structures are drawn.
机译:GaAs MESFET中的表面电势效应不仅会在源极和栅极之间形成耗尽区,而且还会在栅极和漏极之间形成耗尽区。研究了这种现象对器件性能,直流和交流特性以及预期性能的影响。为此,使用基本半导体方程的二维分辨率。该模型通过包括能量松弛方程来考虑松弛效应。给出了MESFET特性(如跨导,输出电导和电容)对发生表面电势影响的区域的尺寸的依赖性。得出了一些有关优化内栅结构的有趣结论。

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