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Physical models for amorphous-silicon thin-film transistors and their implementation in a circuit simulation program

机译:非晶硅薄膜晶体管的物理模型及其在电路仿真程序中的实现

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A semianalytic theory to describe both the current-voltage and capacitance-voltage characteristics of amorphous silicon thin-film transistors on the basis of their physics of operation is presented. In this model, the drain current is directly related to the electron concentration at the source side of the channel. This enables one to describe the various regimes of operation of these devices (i.e. subthreshold or above threshold) using only one equation. The output conductance of these devices in saturation is also considered, and it is shown that the finite output impedance is a consequence of the drain voltage modulating the effective channel length by creating a space-charge limited current region of variable length near the drain. The results of this model are in good agreement both with experimental data and the results of comprehensive two-dimensional simulations. These device models have been successfully incorporated into a SPICE circuit simulation program.
机译:提出了一种基于非晶硅薄膜晶体管工作原理来描述其电流-电压和电容-电压特性的半解析理论。在该模型中,漏极电流与沟道源侧的电子浓度直接相关。这使人们能够仅使用一个方程式来描述这些设备的各种工作方式(即低于阈值或高于阈值)。还考虑了这些器件处于饱和状态时的输出电导,结果表明,有限的输出阻抗是漏极电压通过在漏极附近产生可变长度的空间电荷受限电流区域来调制有效沟道长度的结果。该模型的结果与实验数据和全面的二维模拟结果都非常吻合。这些器件模型已成功地整合到SPICE电路仿真程序中。

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