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Infrared photoconductivity via deep copper acceptors in silicon-doped, copper-compensated gallium arsenide photoconductive switches

机译:掺硅,补偿铜的砷化镓镓光电导开关中深铜受体的红外光电导性

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Silicon-doped, copper-compensated, semi-insulated gallium arsenide of various doping parameters was studied with respect to infrared photoconductivity. This material is used as a photoconductive switch, the bistable optically controlled semiconductor switch (BOSS). One limitation was the relatively low conductivity of the device during the on-state. Typically, silicon-doped gallium arsenide is converted to semi-insulating gallium arsenide by the thermal diffusion of copper into the GaAs:Si. It is shown that variation of the diffusion parameters can improve the on-state conductivity by the enhancement of the concentration of a copper center known as Cu/sub B/. The conductivity of the device 150 ns after irradiation from a 20-ns FWHM laser pulse ( lambda =1.1 mu m) is recorded for various incident energies. This on-state conductivity saturates at a value that is predicted by the densities of the copper levels and the mobility.
机译:针对红外光电导性,研究了各种掺杂参数的硅掺杂,铜补偿,半绝缘砷化镓。这种材料用作光电导开关,即双稳态光控半导体开关(BOSS)。一个限制是在导通状态下器件的电导率相对较低。通常,通过将铜热扩散到GaAs:Si中,将掺硅砷化镓转化为半绝缘砷化镓。结果表明,扩散参数的变化可以通过提高称为Cu / sub B /的铜中心的浓度来改善导通态电导率。对于各种入射能量,记录了20 ns FWHM激光脉冲(λ= 1.1μm)照射后器件150 ns的电导率。该导通状态的电导率饱和在由铜能级的密度和迁移率预测的值。

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