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首页> 外文期刊>IEEE Transactions on Electron Devices >Correlation between forward voltage drop and local carrier lifetime for a large area segmented thyristor
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Correlation between forward voltage drop and local carrier lifetime for a large area segmented thyristor

机译:大面积分段晶闸管的正向压降与局部载流子寿命之间的相关性

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The forward voltage drop for individual segments of a large area thyristor has been correlated to the local, bulk carrier lifetime by lifetime mapping of the the wafer after final device processing. The lifetime mapping was performed under high injection conditions using an all-optical technique where carriers were generated by a short YAG laser pulse and the subsequent carrier decay was monitored by an IR laser beam using free carrier absorption. The lateral resolution was /spl sim/100 /spl mu/m. The lifetime map revealed heavily contaminated areas where the lifetime was reduced by more than an order of magnitude. The forward voltage drop for corresponding thyristor segments was high and, for some areas, no stable turn-on could be achieved. Deep Level Transient Spectroscopy characterization of contaminated areas confirmed the lifetime measurement results and suggest that the contamination is most likely due to metal impurities introduced in the first extended-time/high-temperature drive-in of the p-base. Device simulations showed qualitative agreement between the bulk carrier lifetime and the corresponding voltage drop.
机译:大面积晶闸管各段的正向压降已通过在最终器件处理后对晶片进行寿命映射而与局部,大载流子寿命相关联。使用全光学技术在高注入条件下进行寿命映射,其中通过短YAG激光脉冲生成载流子,并通过使用自由载流子吸收的IR激光束监测随后的载流子衰减。横向分辨率为/ spl sim / 100 / spl mu / m。寿命图显示了受污染严重的区域,寿命缩短了一个数量级。相应晶闸管段的正向压降很高,在某些地区,无法实现稳定的导通。污染区域的深层瞬态光谱学表征证实了寿命测量结果,并表明这种污染最有可能是由于在p碱的首次延长时间/高温压入中引入的金属杂质。器件仿真显示了大载流子寿命与相应的压降之间的定性一致性。

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