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Comment on modeling of minority-carrier transport in nonuniformly doped silicon regions with asymptotic expansions [and reply]

机译:关于渐近扩展的非均匀掺杂硅区域中少数载流子传输建模的评论[和回复]

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The most important result of a recent paper by Rinaldi [see ibid., vol. 40, p. 2307-17, 1993] was the development of a new, more accurate solution for the saturation current corresponding to a nonuniformly doped semiconductor region. Such a claim of novelty is unacceptable, since the same solution had been published earlier. This comment criticizes the liberal use of the word new in the original paper, as well as the methodology followed to derive the solutions. The Appendix suggests, however, a valuable mathematical transformation that permits a factor seven reduction of the computation time of the saturation current. A reply to the comments is appended.
机译:Rinaldi最近的一篇论文最重要的结果[参见同上,第一卷。第40页[2307-17,1993]是针对与不均匀掺杂的半导体区域相对应的饱和电流的一种新的,更精确的解决方案的开发。这样的新颖性主张是不可接受的,因为早前已经发布了相同的解决方案。该评论批评了原始论文中new一词的自由使用,以及为得出解决方案而遵循的方法。但是,附录提出了一种有价值的数学变换,该变换允许将饱和电流的计算时间减少七分之一。对评论的回复附在后面。

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