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Quantifying neutral base recombination and the effects of collector-base junction traps in UHV/CVD SiGe HBTs

机译:量化UHV / CVD SiGe HBT中的中性碱重组以及集电极-基结陷阱的影响

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This work quantifies neutral base recombination in UHV/CVD SiGe heterojunction bipolar transistors (HBTs) using calibrated two-dimensional (2-D) simulation. The simulated collector-base conductance through neutral base recombination (NBR) modulation is far below the experimentally observed values, and hence does not explain the measured output resistance degradation under forced-I/sub B/ operation. In spite of the output resistance degradation, these UHV/CVD SiGe HBTs have approximately the same base current as the silicon control, and hence higher current gain. Based on the observation of the majority carrier concentration limited recombination in the CB junction depletion layer, as opposed to the minority carrier concentration limited recombination in the neutral base, local presence of traps in the CB junction depletion layer is suggested. This explains the measured CB conductance modulation and the related output resistance degradation without compromising the current gain. Numerical simulations using traps locally introduced into the CB junctions successfully reproduced the measured collector-base conductance from simulation without appreciable degradation in current gain.
机译:这项工作使用校准的二维(2-D)模拟量化了UHV / CVD SiGe异质结双极晶体管(HBT)中的中性基复合。通过中性基极重组(NBR)调制模拟的集电极-基极电导率远低于实验观察到的值,因此无法解释在强制I / sub B /操作下测得的输出电阻降级。尽管输出电阻降低,但这些UHV / CVD SiGe HBT具有与硅控件近似相同的基极电流,因此具有更高的电流增益。基于对CB结耗尽层中多数载流子浓度受限重组的观察,与中性基极中少数载流子浓度受限的重组相反,建议在CB结耗尽层中局部存在陷阱。这解释了在不影响电流增益的情况下测得的CB电导调制和相关的输出电阻降低。使用局部引入到CB结中的陷阱进行的数值模拟成功地从模拟中复制了测得的集电极-基极电导,而电流增益没有明显下降。

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