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Collector-base junction avalanche multiplication effects in advanced UHV/CVD SiGe HBTs

机译:先进的UHV / CVD SiGe HBT中的集电极-基结雪崩倍增效应

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The collector-base junction avalanche multiplication factor (M-1) in SiGe HBTs is investigated using a new technique better tolerant to self-heating and collector-base leakage. The new technique provides higher accuracy at low current densities and enables M-1 to be measured at high current densities typically used in circuits. Comparisons with identically processed silicon control devices show that M-1 is not inadvertently increased by the incorporation of SiGe, despite its smaller bandgap. With cooling, M-1 first increases, and then saturates when T>117 K. A 2.3 V critical reverse CB voltage at which base current reversal occurs is observed down to 83 K, which is sufficiently high for today's bipolar and BiCMOS logic applications.
机译:使用一种新的技术来研究SiGe HBT中的集电极-基极结雪崩倍增因子(M-1),该技术对自热和集电极-基极泄漏具有更好的耐受性。新技术在低电流密度下提供了更高的精度,并使M-1可以在电路中通常使用的高电流密度下进行测量。与相同处理的硅控制器件的比较表明,尽管SiGe的带隙较小,但掺入SiGe不会无意中增加M-1。随着冷却,M-1首先增加,然后在T> 117 K时达到饱和。观察到发生基极电流反向的2.3 V临界反向CB电压低至83 K,对于当今的双极性和BiCMOS逻辑应用而言,这已经足够高了。

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