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Junction leakage characteristics in modified LOCOS isolation structures with a nitride spacer

机译:具有氮化物隔离层的改进LOCOS隔离结构中的结泄漏特性

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Junction leakage characteristics in modified local oxidation of silicon (LOCOS) isolation structures have been studied when a nitride spacer was used to prevent bird's beak encroachment. Junction leakages with very low activation energy and strong voltage dependence were observed in the nitride spacered LOCOS. Comparative studies on the junction leakages of nonrecessed and recessed LOCOS have revealed that an additional silicon recess process after nitride spacer formation reduces the junction leakage current.
机译:当使用氮化物隔离层防止鸟嘴侵犯时,已经研究了硅改性局部氧化(LOCOS)隔离结构中的结泄漏特性。在氮化物隔离的LOCOS中观察到具有非常低的活化能和很强的电压依赖性的结泄漏。对非凹陷和凹陷LOCOS的结泄漏的比较研究表明,在氮化物间隔层形成之后进行额外的硅凹陷工艺可降低结泄漏电流。

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