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首页> 外文期刊>IEEE Transactions on Electron Devices >Characterization of Programmed Charge Lateral Distribution in a Two-Bit Storage Nitride Flash Memory Cell by Using a Charge-Pumping Technique
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Characterization of Programmed Charge Lateral Distribution in a Two-Bit Storage Nitride Flash Memory Cell by Using a Charge-Pumping Technique

机译:利用电荷泵技术表征两位存储氮化物闪存单元中程序化电荷的横向分布

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摘要

In this paper, we use a modified charge pumping technique to characterize the programmed charge lateral distribution in a hot electron program/hot hole erase, two-bit storage nitride Flash memory cell. The stored charge distribution of each bit over the source/drain junctions can be profiled separately. Our result shows that the second programmed bit has a broader stored charge distribution than the first programmed bit. The reason is that a large channel field exists under the first programmed bit during the second bit programming. Such a large field accelerates channel electrons and causes earlier electron injection into the nitride. In addition, we find that programmed charges spread further into the channel as program/erase cycle number increases.
机译:在本文中,我们使用一种改进的电荷泵技术来表征热电子编程/热空穴擦除,两位存储氮化物闪存存储单元中的编程电荷横向分布。源/漏结上每个位的存储电荷分布可以分别分析。我们的结果表明,第二个编程位比第一个编程位具有更宽的存储电荷分布。原因是在第二位编程期间,在第一编程位下方存在较大的通道字段。如此大的电场会加速沟道电子,并导致较早的电子注入到氮化物中。此外,我们发现随着编程/擦除周期数的增加,编程电荷会进一步扩散到通道中。

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