首页> 外国专利> SUBSTRATE ELECTRON INJECTION TECHNIQUES FOR PROGRAMMING NON-VOLATILE CHARGE STORAGE MEMORY CELLS

SUBSTRATE ELECTRON INJECTION TECHNIQUES FOR PROGRAMMING NON-VOLATILE CHARGE STORAGE MEMORY CELLS

机译:用于非挥发性电荷存储记忆细胞编程的基质电子注入技术

摘要

A programming technique for a flash memory causes electrons to be injected from the substrate into charge storage elements of the memory cells. The source and drain regions of memory cells along a common word line or other common control gate line being programmed by a voltage applied to the common line are caused to electrically float while the source and drain regions of memory cells not being programmed have voltages applied thereto. This programming technique is applied to large arrays of memory cells having either a NOR or a NAND architecture.
机译:用于闪存的编程技术使得电子从衬底注入到存储单元的电荷存储元件中。沿着公共字线或其他公共控制栅线的存储单元的源极和漏极区域被施加到该公共线的电压编程而引起电浮动,而未被编程的存储单元的源极和漏极区域被施加电压。该编程技术被应用于具有NOR或NAND架构的大型存储单元阵列。

著录项

  • 公开/公告号EP1829044B1

    专利类型

  • 公开/公告日2008-11-26

    原文格式PDF

  • 申请/专利权人 SANDISK CORP;

    申请/专利号EP20050802297

  • 发明设计人 SAMACHISA GEORGE;

    申请日2005-08-05

  • 分类号G11C16/10;

  • 国家 EP

  • 入库时间 2022-08-21 19:20:14

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