首页> 外文期刊>IEEE Transactions on Electron Devices >Carbon Nanotube Field-Effect Transistors for High-Performance Digital Circuits—DC Analysis and Modeling Toward Optimum Transistor Structure
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Carbon Nanotube Field-Effect Transistors for High-Performance Digital Circuits—DC Analysis and Modeling Toward Optimum Transistor Structure

机译:用于高性能数字电路的碳纳米管场效应晶体管—最佳晶体管结构的直流分析和建模

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摘要

Scaling of silicon technology continues while a research has started in other novel materials for future technology generations beyond year 2015. Carbon nanotubes (CNTs) with their excellent carrier mobility are a promising candidate. The authors investigated different CNT-based field effect transistors (CNFETs) for an optimal switch. Schottky-barrier (SB) CNFETs, MOS CNFETs, and state-of-the-art Si MOSFETs were systematically compared from a circuit/system design perspective. The authors have performed a dc analysis and determined how noise margin and voltage swing vary as a function of tube diameter and power-supply voltage. The dc analysis of single-tube SB CNFET transistors revealed that the optimum CNT diameter for achieving the best ION-to-IOFF ratio while maintaining a good noise margin is about 1 to 1.5 nm. Despite several serious technological barriers and challenges, CNTs show a potential for future high-performance devices as they are being researched
机译:硅技术的规模仍在继续扩展,同时已开始针对其他新型材料进行研究,以供2015年后的下一代技术使用。具有出色的载流子迁移率的碳纳米管(CNT)是有前途的候选人。作者研究了不同的基于CNT的场效应晶体管(CNFET),以获得最佳开关。从电路/系统设计的角度系统地比较了肖特基势垒(SB)CNFET,MOS CNFET和最新的Si MOSFET。作者进行了直流分析,并确定了噪声容限和电压摆幅如何随管直径和电源电压的变化而变化。单管SB CNFET晶体管的dc分析表明,在保持良好噪声容限的同时,实现最佳ION / IOFF比的最佳CNT直径约为1至1.5 nm。尽管存在若干严峻的技术障碍和挑战,但是碳纳米管在研究过程中仍显示出未来高性能器件的潜力。

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