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Multitime Programmable Memory Cell With Improved MOS Capacitor in Standard CMOS Process

机译:采用标准CMOS工艺的具有改进型MOS电容器的多时间可编程存储单元

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A multitime programmable memory cell with improved MOS capacitor is proposed in this paper. The improved MOS capacitor has p-type junction near the channel, which prevents the capacitor from deep depletion, and this helps to improve the cell’s program/erase efficiency and stability. A test chip is fabricated using a 0.13- standard CMOS process without any extra masks or process modification. The experimental results show that the proposed cell achieves much faster and more stable program/erase speed than do the cells using the conventional MOS capacitor. Furthermore, endurance characteristics of up to 10-k cycles and data retention at 250 °C are presented, and the results indicate that the improved MOS capacitor does not affect the cell’s reliability.
机译:本文提出了一种具有改进型MOS电容器的多时间可编程存储单元。经过改进的MOS电容器在沟道附近具有p型结,可防止电容器深度耗尽,这有助于提高单元的编程/擦除效率和稳定性。测试芯片是使用0.13标准CMOS工艺制造的,没有任何额外的掩模或工艺修改。实验结果表明,与使用常规MOS电容器的单元相比,拟议的单元实现了更快,更稳定的编程/擦除速度。此外,还展示了长达10k的耐力特性和在250°C时的数据保持能力,结果表明改进的MOS电容器不会影响电池的可靠性。

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