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Experimental DC Extraction of the Base Resistance of Bipolar Transistors: Application to SiGe:C HBTs

机译:双极晶体管基极电阻的实验性直流提取:在SiGe:C HBT中的应用

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摘要

This paper presents an improved variant of a dc method to experimentally evaluate the base resistance of a bipolar transistor. The technique relies on a device model associated with a simple parameter optimization methodology, and is suited for modern technologies wherein self-heating and impact-ionization effects play a relevant role. The approach is successfully applied to state-of-the-art SiGe:C heterojunction bipolar transistors for high-frequency applications, although it can in principle be exploited for any bipolar device. The accuracy of the method is verified by numerical and experimental procedures.
机译:本文提出了一种直流方法的改进版本,可通过实验评估双极晶体管的基极电阻。该技术依赖于与简单参数优化方法相关的设备模型,并且适用于自加热和碰撞电离效应起重要作用的现代技术。尽管该方法原则上可以用于任何双极型器件,但该方法已成功应用于用于高频应用的最新SiGe:C异质结双极型晶体管。通过数值和实验程序验证了该方法的准确性。

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