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Near-Infrared Detection Using Pulsed Tunneling Junction in Silicon Devices

机译:硅器件中使用脉冲隧道结的近红外检测

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摘要

We exploit the potential of the pulsed tunneling bias condition in silicon junctions (the Zener junction and the drain surface junction in nMOSFETs) to detect near-infrared (NIR) photon signals. A combination of the Franz–Keldysh effect and avalanche multiplication with minimization of the thermal effect through a pulsed tunneling bias is found to provide infrared radiation sensitivities as high as 1.18 and 0.89 A/W at the wavelengths of 1310 and 1550 nm, respectively, in a Zener diode. The potential of the drain surface junction in MOSFETs to function as an NIR sensor is also investigated using a similar bias scheme.
机译:我们利用硅结(齐纳结和nMOSFET的漏极表面结)中的脉冲隧穿偏置条件的潜力来检测近红外(NIR)光子信号。发现Franz–Keldysh效应和雪崩倍增以及通过脉冲隧穿偏置使热效应最小化的组合分别在1310和1550 nm的波长下分别提供高达1.18和0.89 A / W的红外辐射灵敏度。齐纳二极管。还使用类似的偏置方案研究了MOSFET中漏极表面结用作NIR传感器的电势。

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