Tristate Memory Cells Using Double-Peaked Fin-Array III–V Tunnel Diodes Monolithically Grown on (001) Silicon Substrates

摘要

We demonstrate functional tristate memory cells using multipeaked GaAs/InGaAs fin-array tunnel diodes grown on exact (001) Si substrates. On-chip connection of single-peaked tunnel diode arrays produces I–V characteristics with multiple negative-differential resistance regions. We designed and fabricated two types of tristate memory cells. In one design, a double-peaked tunnel diode was used as the drive, and a reverse-biased single-peaked tunnel diode was used as the load. In the other design, the tristate memory cell was realized by the series connection of two forward-biased single-peaked tunnel diodes.