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An NMOS input merged bipolar/sidewall-MOS transistor with a bypass sidewall MOS transistor (NBiBMOS transistor)

机译:具有旁路侧壁MOS晶体管(NBiBMOS晶体管)的NMOS输入合并双极/侧壁MOS晶体管

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摘要

The concept of merging a vertical n-p-n bipolar and two sidewall NMOS transistors into an NMOS input merged bipolar/sidewall-MOS transistor with a bypass sidewall NMOS transistor structure (NBiBMOS transistor) is described. The output current of this structure, unlike that of NBiMOS transistors, is significant even when the output voltage (V/sub CE/ or V/sub DE/) is less than the turn-on voltage of the n-p-n bipolar transistor (V/sub BE/= approximately 0.8 V). This structure, when used in BiCMOS logic gates, will allow the output voltage to swing all the way to 0.0 V rather than to 0.8 V. The feasibility of this concept was demonstrated by fabricating and DC characterizing the NBiBMOS transistor structures, which occupy approximately 1.2 times the area of a single n-p-n bipolar transistor. The NBiBMOS transistor has a higher drive capability than that of a structure consisting of an NBiMOS and a separate bypass transistor, because the body-source junction of the bypass NMOS transistor is forward biased.
机译:描述了将垂直的n-p-n双极和两个侧壁NMOS晶体管合并为具有旁路侧壁NMOS晶体管结构(NBiBMOS晶体管)的NMOS输入合并的双极/侧壁-MOS晶体管的概念。这种结构的输出电流与NBiMOS晶体管不同,即使输出电压(V / sub CE /或V / sub DE /)小于npn双极晶体管的导通电压(V / sub BE / =约0.8 V)。这种结构在BiCMOS逻辑门中使用时,将允许输出电压一直摆动至0.0 V而不是0.8V。该概念的可行性通过制造和直流表征NBiBMOS晶体管结构来证明,该结构大约占据1.2伏。乘以单个npn双极晶体管的面积。 NBiBMOS晶体管的驱动能力高于由NBiMOS和单独的旁路晶体管组成的结构,因为旁路NMOS晶体管的体-源结被正向偏置。

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