首页> 外文期刊>IEEE Electron Device Letters >Ultra low noise characteristics of AlGaAs/InGaAs/GaAs pseudomorphic HEMT's with wide head T-shaped gate
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Ultra low noise characteristics of AlGaAs/InGaAs/GaAs pseudomorphic HEMT's with wide head T-shaped gate

机译:具有宽头T形栅极的AlGaAs / InGaAs / GaAs伪晶HEMT的超低噪声特性

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摘要

The fully passivated low noise AlGaAs/InGaAs/GaAs pseudomorphic (PM) HEMT with 0.13 /spl mu/m T-shaped gate was fabricated using dose split electron beam lithography method (DSM). This device exhibited low noise figures of 0.31 and 0.45 dB at 12 and 18 GHz, respectively. These noise figures are the lowest value ever reported for the GaAs based HEMT's. These results are attributed to the extremely low gate resistance which results from wide head T-shaped gate having the higher ratio more than 10 of gate head length to gate footprint.
机译:采用剂量分割电子束光刻法(DSM)制造了具有0.13 / splμm/ m T形栅极的完全钝化的低噪声AlGaAs / InGaAs / GaAs伪晶质(PM)HEMT。该器件在12 GHz和18 GHz时分别具有0.31和0.45 dB的低噪声系数。这些噪声系数是基于GaAs的HEMT所报告的最低值。这些结果归因于极低的栅极电阻,这是由宽头T形栅极产生的,该栅极的T形栅极的栅极头部长度与栅极占位面积之比大于10。

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