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Temperature-Dependent Characteristics of Cylindrical Gate-All-Around Twin Silicon Nanowire MOSFETs (TSNWFETs)

机译:圆柱型全栅极双硅纳米线MOSFET(TSNWFET)的温度相关特性

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The characteristics of cylindrical gate-all-around twin silicon nanowire field-effect transistors with a radius of 5 nm have been measured in temperatures T ranging from 4 to 300 K. The dependence of the off-current suggests that thermal generation in the channel is the main leakage mechanism. The dependence of the subthreshold swing exhibits no body effects but shows degradations due to slight differences in the threshold voltages and in the body effect constants of the twin nanowires. The T dependence of the peak normalized transconductance gm /VDS gives a clue of 1-D phonon scattering and suggests that surface roughness scattering at the nanowire wall is dominant at low values.
机译:已经在4至300 K的温度T下测量了半径为5 nm的圆柱形全栅双晶硅纳米线场效应晶体管的特性。截止电流的依赖性表明,沟道中的热产生是主要的泄漏机理。亚阈值摆幅的依赖性没有表现出任何体效应,但是由于双纳米线的阈值电压和体效应常数的微小差异而导致了退化。峰归一化跨导gm / VDS的T依赖性给出了1-D声子散射的线索,并表明在低值下纳米线壁的表面粗糙度散射占主导地位。

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