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Dual-Color Electroluminescence ($lambda approx hbox{450} hbox{nm}$ and 650–700 nm) From a Silicon-Based Light Source

机译:双色电致发光(基于硅的光源)(λ约为hbox {450} hbox {nm} $和650–700 nm)

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In this letter, bright "purple" electroluminescence is observed from a multilayer stack with thin amorphous silicon (alpha-Si)/SiO2, due to the dual-color light emissions in blue and red. Under photoexcitation, the blue emission is negligible compared with the long wavelength red emission and is only present weakly after anneal in N2 exceeding 900degC. However, under electrical excitation, the blue becomes obviously visible and shows faster increasing rate with increased carrier injection than the red. From analysis of the samples with different alpha-Si thicknesses (2-7 nm), the red emission is deemed to have resulted from the quantum-confinement effect within the thin alpha-Si layers, whereas the blue emission is speculated to have originated from the Si/SiO2 interfacial defects.
机译:在这封信中,由于蓝色和红色的双色光发射,从具有薄非晶硅(alpha-Si)/ SiO2的多层堆叠中观察到了明亮的“紫色”电致发光。在光激发下,与长波长的红色发射相比,蓝色的发射可以忽略不计,并且仅在退火后在超过900摄氏度的氮气中微弱地存在。但是,在电激发下,蓝色明显变得可见,并且随着载流子注入的增加,蓝色的显示速率比红色更快。通过分析具有不同α-Si厚度(2-7 nm)的样品,红色发射被认为是由薄α-Si层内的量子限制效应引起的,而蓝色发射被认为是源自于Si / SiO2界面缺陷。

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