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Dual-Color Electroluminescence (λ ≈ 450 nm and 650–700 nm) From a Silicon-Based Light Source

机译:硅基光源的双色电致发光(λ≈450 nm和650–700 nm)

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In this letter, bright “purple” electroluminescence is observed from a multilayer stack with thin amorphous silicon $(alphahbox{-Si})/hbox{SiO}_{2}$, due to the dual-color light emissions in blue and red. Under photoexcitation, the blue emission is negligible compared with the long wavelength red emission and is only present weakly after anneal in $ hbox{N}_{2}$ exceeding 900 $^{circ}hbox{C}$. However, under electrical excitation, the blue becomes obviously visible and shows faster increasing rate with increased carrier injection than the red. From analysis of the samples with different $alphahbox{-Si}$ thicknesses (2–7 nm), the red emission is deemed to have resulted from the quantum-confinement effect within the thin $alphahbox{-Si}$ layers, whereas the blue emission is speculated to have originated from the $ hbox{Si/SiO}_{2}$ interfacial defects.
机译:在这封信中,由于蓝色和红色的双色光发射,从具有薄非晶硅$(alphahbox {-Si})/ hbox {SiO} _ {2} $的多层堆叠中观察到了明亮的“紫色”电致发光。在光激发下,蓝色发射与长波长红色发射相比可忽略不计,并且仅在退火后的$ hbox {N} _ {2} $超过900 $ ^ circcirchbox {C} $时才微弱地出现。但是,在电激发下,蓝色明显变得可见,并且随着载流子注入的增加,蓝色的显示速率比红色更快。通过分析具有不同$ alphahbox {-Si} $厚度(2–7 nm)的样品,红色发射被认为是由薄$ alphahbox {-Si} $层内的量子约束效应引起的,而推测蓝色发射源于hbox {Si / SiO} _ {2} $界面缺陷。

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