首页> 外文期刊>Electron Device Letters, IEEE >Program Trapped-Charge Effect on Random Telegraph-Noise Amplitude in a Planar SONOS Flash Memory Cell
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Program Trapped-Charge Effect on Random Telegraph-Noise Amplitude in a Planar SONOS Flash Memory Cell

机译:平面SONOS闪存单元中随机电报噪声幅度的程序捕获电荷效应。

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Program-charge effects in a SONOS Flash cell on the amplitude of random telegraph noise (RTN) are investigated. We measure RTN in 45 planar SONOS cells and 40 floating-gate (FG) cells in erase state and program state, respectively. We find that a SONOS cell has a wide spread in RTN amplitudes after programming, while an FG cell has identical RTN amplitudes in erase and program states at the same read-current level. A 3-D atomistic simulation is performed to calculate RTN amplitudes. Our result shows that the wide spread of program-state RTN amplitudes in a SONOS cell is attributed to a current-path-percolation effect caused by random discrete nitride charges.
机译:研究了SONOS闪存单元中程序电荷对随机电报噪声(RTN)幅度的影响。我们分别在擦除状态和编程状态下测量了45个平面SONOS单元和40个浮栅(FG)单元中的RTN。我们发现,在编程后,SONOS单元在RTN幅度上的分布很广,而FG单元在相同的读取电流水平下在擦除和编程状态下具有相同的RTN幅度。执行3-D原子模拟以计算RTN振幅。我们的结果表明,SONOS单元中编程状态RTN幅度的广泛传播归因于随机离散氮化物电荷引起的电流路径渗流效应。

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