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Characterizations of Amorphous IGZO Thin-Film Transistors With Low Subthreshold Swing

机译:低亚阈值摆幅的非晶IGZO薄膜晶体管的特性

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Subthreshold swing (SS) is a key parameter in evaluating the power consumption and material properties of thin-film transistors (TFTs). In this letter, we report an amorphous indium gallium zinc oxide (a-IGZO) TFT with a high-$kappa $$ hbox{SiO}_{2}/hbox{HfO}_{2}$ gate insulator. The device shows a SS of 96 mV/decade and an on-to-off current ratio of $hbox{1.5} times hbox{10}^{10}$. The low SS was attributed to the fully depleted channel state, low interface defects, and efficient modulation of the device. With low defect states, the device demonstrates only 2.71% change of operating currents after $hbox{1.5} times hbox{10}^{4} hbox{s}$ stress.
机译:亚阈值摆幅(SS)是评估薄膜晶体管(TFT)的功耗和材料特性的关键参数。在这封信中,我们报道了一种非晶态铟镓锌氧化物(a-IGZO)TFT,具有高kappa $$ hbox {SiO} _ {2} / hbox {HfO} _ {2} $栅极绝缘体。该器件的SS为96 mV /十倍,通断电流比为$ hbox {1.5}乘以hbox {10} ^ {10} $。较低的SS归因于完全耗尽的通道状态,较低的界面缺陷以及器件的有效调制。在低缺陷状态下,在$ hbox {1.5}乘以hbox {10} ^ {4} hbox {s} $应力后,该器件的工作电流仅变化2.71%。

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