Zinc Oxide Thin-Film Transistors with Location-Controlled Crystal Grains Fabricated by Low-Temperature Hydrothermal Method

摘要

High-performance zinc oxide (ZnO) bottom-gate (BG) thin-film transistors (TFTs) with a single vertical grain boundary in the channel have been successfully fabricated by a novel low-temperature (i.e., 85 $^{circ}hbox{C}$) hydrothermal method. The ZnO active channel was laterally grown with an aluminum-doped ZnO seed layer underneath the Ti/Pt film. Consequently, such BG-TFTs $({W/L} = hbox{250} muhbox{m}/hbox{10} muhbox{m})$ demonstrated the high field-effect mobility of 9.07 $hbox{cm}^{2}/hbox{V}cdot hbox{s}$, low threshold voltage of 2.25 V, high on/off-current ratio above $hbox{10}^{6}$, superior current drivability, indistinct hysteresis phenomenon, and small standard deviations among devices, attributed to the high-quality ZnO channel with the single grain boundary.