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首页> 外文期刊>Electron Device Letters, IEEE >Ultrahigh on/off -Current Ratio for Resistive Memory Devices With Poly(N-Vinylcarbazole)/Poly(3, 4-Ethylenedioxythiophene)–Poly(Styrenesulfonate) Stacking Bilayer
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Ultrahigh on/off -Current Ratio for Resistive Memory Devices With Poly(N-Vinylcarbazole)/Poly(3, 4-Ethylenedioxythiophene)–Poly(Styrenesulfonate) Stacking Bilayer

机译:具有聚(N-乙烯基咔唑)/聚(3,4-乙烯二氧噻吩)-聚(苯乙烯磺酸盐)堆叠双层的电阻存储器件的超高通/断电流比

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摘要

An ultrahigh on/off -current ratio of $hbox{5} times hbox{10}^{9}$ is presented in a resistive memory device using Au nanoparticles (Au NPs)-incorporated poly(N-vinylcarbazole) (PVK) and poly(3, 4-ethylenedioxythiophene)–poly(styrenesulfonate) (PEDOT–PSS) stacking configurations as the active layer and Al as electrodes for nonvolatile-memory application. The investigation also suggests that the enhancement of the on/off-current ratio cannot be achieved by simply increasing the thickness of the PVK:Au NPs layer itself. This PVK:Au-NPs/PEDOT–PSS stacking-bilayer memory device also demonstrates good retention of high on /off-current ratio for at least 2 h and remains programmable at 125 $^{circ}hbox{C}$.
机译:在使用金纳米粒子(Au NPs)并入了聚(N-乙烯基咔唑)(PVK)的电阻存储器件中,给出了$ hbox {5}乘以hbox {10} ^ {9} $的超高开/关电流比。聚(3,4-乙撑二氧噻吩)-聚(苯乙烯磺酸盐)(PEDOT-PSS)堆叠结构作为活性层,铝作为电极用于非易失性存储器。研究还表明,仅通过增加PVK:Au NPs层本身的厚度无法实现通/断电流比的提高。该PVK:Au-NPs / PEDOT-PSS堆叠双层存储器件还显示出高的通/断电流比至少2 h的良好保持能力,并且可在125℃下保持可编程。

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