首页> 外文期刊>Electron Device Letters, IEEE >Nonplanar NiSi Nanocrystal Floating-Gate Memory Based on a Triangular-Shaped Si Nanowire Array for Extending Nanocrystal Memory Scaling Limit
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Nonplanar NiSi Nanocrystal Floating-Gate Memory Based on a Triangular-Shaped Si Nanowire Array for Extending Nanocrystal Memory Scaling Limit

机译:基于三角形硅纳米线阵列的非平面NiSi纳米晶浮栅存储器,用于扩展纳米晶存储比例极限

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摘要

A nonplanar Flash memory architecture with ultrahigh-density $(sim!! hbox{1.5} times hbox{10}^{12} hbox{cm}^{-2})$ NiSi nanocrystals (NCs) as the floating gate is demonstrated using a triangular-shaped Si nanowire array as the memory transistor channel. The memory device shows good programming, erasing, and retention characteristics. This result suggests that nonplanar devices can extend NC memory scaling limit.
机译:使用超高密度$(sim!hbox {1.5}乘以hbox {10} ^ {12} hbox {cm} ^ {-2})$ NiSi纳米晶体(NCs)作为浮栅的非平面闪存架构三角形的Si纳米线阵列作为存储晶体管通道。该存储设备显示出良好的编程,擦除和保留特性。该结果表明非平面设备可以扩展NC内存扩展限制。

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