首页> 外文期刊>Electron Device Letters, IEEE >$hbox{ZrLaO}_{x}hbox{/ZrTiO}_{x}hbox{/ZrLaO}_{x}$ Laminate as Insulator for MIM Capacitors With High Capacitance Density and Low Quadratic Voltage Coefficient Using Canceling Effect
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$hbox{ZrLaO}_{x}hbox{/ZrTiO}_{x}hbox{/ZrLaO}_{x}$ Laminate as Insulator for MIM Capacitors With High Capacitance Density and Low Quadratic Voltage Coefficient Using Canceling Effect

机译:$ hbox {ZrLaO} _ {x} hbox {/ ZrTiO} _ {x} $层压板作为MIM电容器的绝缘体,具有抵消电容,具有高电容密度和低二次方电压系数

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Metal–insulator–metal (MIM) capacitors with $hbox{ZrLaO}_{x} hbox{/ZrTiO}_{x}hbox{/ZrLaO}_{x}$ laminate as the insulator were explored in this work. Single $hbox{ZrTiO}_{x}$ dielectric was found to have a negative quadratic voltage coefficient of capacitance (VCC-$alpha$) with a high $kappa$ value of 22.5. By integrating this dielectric with $hbox{ZrLaO}_{x}$ which provides a positive VCC- $alpha$ and a high $kappa$ value of 25.8, the “canceling effect” of VCC-$ alpha$ can be achieved while a high capacitance density can be maintained. MIM capacitors with the laminated structure display desirable characteristics in terms of a capacitance density of 14.6 $hbox{fF}/muhbox{m}^{2}$, a low VCC- $alpha$ of 33 $ hbox{ppm/V}^{2}$, negligible frequency dispersion, and satisfactory leakage current of $hbox{1.6} times hbox{10}^{-6} hbox{A/cm}^{2}$ at $-$1.5 V. These results also well meet the International Technology Roadmap for Semiconductors requirement set for 2020.
机译:本文研究了具有$ hbox {ZrLaO} _ {x} hbox {/ ZrTiO} _ {x} hbox {/ ZrLaO} _ {x} $层压板作为绝缘体的金属-绝缘体-金属(MIM)电容器。发现单个$ hbox {ZrTiO} _ {x} $电介质具有负的二次电容电容电压系数(VCC-α$),具有$ 22.5的高kappa $值。通过将此电介质与$ hbox {ZrLaO} _ {x} $集成在一起,可以提供正的VCC- $ alpha $和$ 2的高kappa $值,可以实现VCC- $ alpha $的“取消效应”,而可以保持高电容密度。具有叠层结构的MIM电容器在电容密度为14.6 $ hbox {fF} / muhbox {m} ^ {2} $,33 V $ -hbox {ppm / V} ^的低VCC- $ alpha $方面显示出理想的特性。 {2} $,可忽略的频率色散和$ hbox {1.6}乘以hbox {10} ^ {-6} hbox {A / cm} ^ {2} $的令人满意的泄漏电流,为$-$ 1.5V。这些结果也很好达到2020年制定的《国际半导体技术路线图》要求。

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