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首页> 外文期刊>IEEE Electron Device Letters >Power Performance at 40 GHz on Quaternary Barrier InAlGaN/GaN HEMT
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Power Performance at 40 GHz on Quaternary Barrier InAlGaN/GaN HEMT

机译:第四级InAlGaN / GaN HEMT上40 GHz时的功率性能

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Depletion-mode high-electron mobility transistors (HEMTs) based on a quaternary barrier ${rm In}_{0.11}{rm Al}_{0.72}{rm Ga}_{0.17}{rm N}/{rm GaN}$ heterostructure on sapphire substrate are fabricated and characterized. This structure shows a very high Hall electron mobility of 2200 ${rm cm}^{2}/{rm V}cdot {rm s}$, which is the highest value ever reported on In-containing GaN-based HEMTs. For T-shaped gate transistor with a gate length of 75 nm, current gain $({rm f}_{t})$ and power gain $({rm f}_{max})$ cutoff frequencies of 113 and 200 GHz are extracted from S-parameter measurements, respectively. Nonlinear characterization of a T-shaped gate device with a gate length of 225 nm gives an output power density of 2 W/mm at 40 GHz. These results clearly demonstrate the capabilities of such quaternary barrier-based devices.
机译:基于四级势垒的耗尽型高电子迁移率晶体管(HEMT)<分子式==“ inline”> $ {rm In} _ {0.11} {rm Al} _ {0.72} {制备并表征了蓝宝石衬底上的rm Ga} _ {0.17} {rm N} / {rm GaN} $ 异质结构。此结构显示了非常高的霍尔电子迁移率,为2200 <分子式 $ {rm cm} ^ {2} / {rm V} cdot {rm s} $ ,这是含In的GaN基HEMT所报道的最高值。对于栅极长度为75 nm的T形栅极晶体管,电流增益<公式公式=“ inline”> $({rm f} _ {t})$ 和功率增益<公式:提取113和200 GHz的截止频率。$({rm f} _ {max})$ 分别来自S参数测量。栅极长度为225 nm的T形栅极器件的非线性特性在40 GHz下给出2 W / mm的输出功率密度。这些结果清楚地证明了这种基于四元势垒的器件的功能。

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