首页> 外文期刊>Electron Device Letters, IEEE >High Reverse Blocking and Low Onset Voltage AlGaN/GaN-on-Si Lateral Power Diode With MIS-Gated Hybrid Anode
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High Reverse Blocking and Low Onset Voltage AlGaN/GaN-on-Si Lateral Power Diode With MIS-Gated Hybrid Anode

机译:具有MIS门控混合阳极的高反向阻断和低启动电压AlGaN / Si-GaN侧向功率二极管

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An AlGaN/GaN-on-Si lateral power diode with recessed metal/AlO/III-nitride (MIS)-gated ohmic anode for improved forward conduction and reverse blocking has been realized. The low onset voltage of V with good uniformity for the fabricated 189 devices is obtained. In comparison with the conventional Schottky diode the specific ON-resistance ( was reduced by 51% in a device with anode-to-cathode spacing ( of 5 . The incorporation of high- dielectric in the recessed gate region enabling two-order lower reverse leakage comparing with the conventional device, leading to a high breakdown voltage over 1.1 kV at leakage current as low as 10 /mm in device with . The strong reverse blocking over 600 V was still achieved at 150 °C. The proposed diode is compatible with GaN normally MIS high-electron-mobility transistors, revealing its potential for highly efficient GaN-on-Si power ICs.
机译:已经实现了具有凹入的金属/ AlO / III氮化物(MIS)门控的欧姆阳极的AlGaN / GaN-on-Si横向功率二极管,用于改善正向传导和反向阻挡。对于所制造的189个器件,获得了具有良好均匀性的低V起始电压。与传统的肖特基二极管相比,其开通电阻(在阳极与阴极之间的间距为5的器件中降低了51%。在凹陷的栅区中加入高电介质可实现二阶更低的反向泄漏)与常规器件相比,该器件在漏电流低至10 / mm的情况下会导致1.1 kV的高击穿电压,在150°C时仍可实现600 V以上的强反向阻断。通常是MIS高电子迁移率晶体管,揭示了其在高效GaN-on-Si功率IC中的潜力。

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