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机译:通过调节AlN缓冲层的底物温度来研究AlGaN / AlN异质结构的生长
CSIR-National Physical Laboratory (NPL) Dr. K. S. Krishnan Marg New Delhi 110012 India;
Advanced Semiconductor Laboratory King Abdullah University of Science and Technology Thuwal 23955 Saudi Arabia;
CSIR-National Physical Laboratory (NPL) Dr. K. S. Krishnan Marg New Delhi 110012 India;
CSIR-National Physical Laboratory (NPL) Dr. K. S. Krishnan Marg New Delhi 110012 India Functional Materials and Microsystems Research Group and the Micro Nano Research Facility RMIT University Melbourne VIC 3000 Australia Academy of Scientific and Innovative Research CSIR-HRDCCampus Ghaziabad Uttar Pradesh 201002 India;
Solid State Physics Laboratory Defence Research and Development Organization Timarpur Delhi 110054 India;
Department of Materials Science and Metallurgy University of Cambridge Cambridge CB3 0FS UK;
CSIR-National Physical Laboratory (NPL) Dr. K. S. Krishnan Marg New Delhi 110012 India Academy of Scientific and Innovative Research CSIR-HRDCCampus Ghaziabad Uttar Pradesh 201002 India;
CSIR-National Physical Laboratory (NPL) Dr. K. S. Krishnan Marg New Delhi 110012 India;
CSIR-National Physical Laboratory (NPL) Dr. K. S. Krishnan Marg New Delhi 110012 India;
CSIR-National Physical Laboratory (NPL) Dr. K. S. Krishnan Marg New Delhi 110012 India Academy of Scientific and Innovative Research CSIR-HRDCCampus Ghaziabad Uttar Pradesh 201002 India;
AlGaN film; Epitaxial growth; PAMBE; Crystalline quality; Al incorporation;
机译:低温氨基分子束外延生长的金属极性AlGaN / AlN / GaN和AlN / GaN异质结构中的纯AlN层
机译:氨MBE在AlN / SiC衬底上生长的高功率场效应晶体管的多层AlN / AlGaN / GaN / AlGaN异质结构
机译:AlN缓冲层对AlGaN / GaN / AlN双异质结构高电子迁移率晶体管的影响
机译:使用多AlN缓冲层在等离子体辅助分子束外延的多Aln缓冲层的生长和特征
机译:块状AlN单晶衬底上的富铝AlGaN和AlN生长
机译:蓝宝石衬底上具有纳米尺度厚AlN成核层的高质量无裂纹AlN薄膜的异质外延生长用于基于AlGaN的深紫外发光二极管
机译:AlN生长温度对原位金属有机化学气相沉积生长AlN / AlGaN / GaN金属-绝缘体-半导体异质结构场效应晶体管的陷阱密度的影响