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Metropolis Monte Carlo based Relaxation of Atomistic III-V Semiconductor Models

机译:基于蒙特卡洛大都会的原子III-V半导体模型的弛豫

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摘要

We present atomistic simulations of III-V semiconductor materials. These provide an effective way to investigate structural properties of semiconductors at a nanometric scale. The crystal structure is relaxed using a Metropolis Monte Carlo scheme, where chemical bonds are described through empirical interaction potentials. The method provides a simplified structural model, which allows to determine elastic properties like the bulk and shear modulus with errors around 5 and 10%. Simulations on random alloys led to a composition-dependent bimodal bond length distribution, stemming from the constituent binary compounds, which was also observed experimentally. In contrast to this, CuPt-ordered structures, which can form spontaneously during epitaxial processes, were shown to exhibit a distinct fourfold bond length pattern leading to built-in strain. The Metropolis Monte Carlo approach also allows modelling at higher temperatures. The asymmetry of the empirical potential function leads to thermal expansion, although this effect is in general overestimated due to the missing Coulomb interaction, which is characteristic of III-V materials.
机译:我们提出了III-V半导体材料的原子模拟。这些提供了研究纳米级半导体结构特性的有效方法。晶体结构使用Metropolis Monte Carlo方案松弛,其中化学键通过经验相互作用势来描述。该方法提供了简化的结构模型,该模型允许确定诸如体积和剪切模量之类的弹性属性,其误差在5%和10%之间。对无规合金的模拟导致了成分相关的双峰键长分布,这是由二元化合物的组成引起的,也可以通过实验观察到。与此形成对比的是,在外延过程中可以自发形成的CuPt有序结构显示出独特的四重键长模式,从而导致了内在应变。 Metropolis Monte Carlo方法还允许在较高温度下进行建模。经验势函数的不对称会导致热膨胀,尽管由于缺少库仑相互作用(通常是III-V材料的特征),通常会高估这种效应。

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