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Metropolis Monte Carlo based Relaxation of Atomistic III-V Semiconductor Models

机译:基于Metropolis Monte Carlo的原子III-V半导体型号

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We present atomistic simulations of III-V semiconductor materials. These provide an effective way to investigate structural properties of semiconductors at a nanometric scale. The crystal structure is relaxed using a Metropolis Monte Carlo scheme, where chemical bonds are described through empirical interaction potentials. The method provides a simplified structural model, which allows to determine elastic properties like the bulk and shear modulus with errors around 5 and 10%. Simulations on random alloys led to a composition-dependent bimodal bond length distribution, stemming from the constituent binary compounds, which was also observed experimentally. In contrast to this, CuPt-ordered structures, which can form spontaneously during epitaxial processes, were shown to exhibit a distinct fourfold bond length pattern leading to built-in strain. The Metropolis Monte Carlo approach also allows modelling at higher temperatures. The asymmetry of the empirical potential function leads to thermal expansion, although this effect is in general overestimated due to the missing Coulomb interaction, which is characteristic of III-V materials.
机译:我们提出了III-V半导体材料的原子模拟。这些提供了一种有效的方法来研究以纳米级的半导体结构特性。使用Metropolis Monte Carlo方案放宽晶体结构,其中通过经验相互作用电位描述化学键。该方法提供了一种简化的结构模型,其允许确定像块状和剪切模量如图5和10%约5%的剪切模量如下。随机合金的模拟导致组成依赖性双峰键长分布,源自构成二元化合物,该组成二元化合物也在实验中观察。与此相反,显示在外延过程中可以自发形成的软曲线有序的结构,以表现出导致内置应变的不同的四倍键长图案。 Metropolis Monte Carlo方法还允许在更高的温度下进行建模。经验潜在功能的不对称性导致热膨胀,尽管由于缺失的库仑相互作用,这种效果通常高估,但是缺失的Coulomb相互作用是III-V材料的特征。

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