20 nm Pitch Directed Block Copolymer Assembly Using Solvent Annealing for Bit Patterned Media

摘要

DirectedselfassemblylSreCOgnlZedas one ofthe mostlikely fabrication methods to meet theStringentlithogrqphic specincations requlred togenerate bit pattemed media（BPM）mastertemplates．WhilemagneticrecordingBPMof托rsaPath to themally stable storage mediall］atdensitiesln eXCeSS Ofl Tb／in2，temPlateSPeCincations impose an unprecedentedlithographic challenge to create unifom fbaturesaccuratelyplaced onto circulartracks with afullPitchunder25nm．E－beamdirected assembly ofblock copolymer mms o飴rs resolutionenhancement through fbature densitymultiplicationandanimprovedfbatureunifomitythroughpattemreCtincationl2，3］thathavemadePOSSible the fabrication ofhighly unifbrmBPMWith a reduced magnetic switching nelddistributionnotachievablebyanyotherfabricationmethod．［4］