Corrosion of Fresh Porous Silicon in Potassium Hydroxide Solution

摘要

Porous silicon samples were fabricated by electrochemical anodization of silicon wafers. Afterfabricating, the corrosion of fresh porous silicon (f-PS) in potassium hydroxide solution in the absenceand presence of ethanol was systemically studied by electrochemical methods, weight lossmeasurements and scanning electron microscope. The effect factors for f-PS corrosion in KOHsolution were investigated. It found that the temperature and composition of corrosion solution canaffect the detection accuracy of weight loss measurements to measure the porosity of f-PS. In addition,the activation parameters (Ea, A, 矵a and a) for f-PS in 1.0 M KOH were obtained.