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Effects of vacuum annealing on the electron mobility of epitaxial La-doped BaSnO3 films

机译:真空退火对外延掺杂La的BaSnO3薄膜电子迁移率的影响

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Wide bandgap (Esubg/sub ~ 3.1 eV) La-doped BaSnOsub3/sub (LBSO) has attracted increasing attention as one of the transparent oxide semiconductors since its bulk single crystal shows a high carrier mobility (~320 cmsup2/sup Vsup?1/sup ssup?1/sup) with a high carrier concentration (~10sup20/sup cmsup?3/sup). For this reason, many researchers have fabricated LBSO epitaxial films thus far, but the obtainable carrier mobility is substantially low compared to that of single crystals due to the formation of the lattice/structural defects. Here we report that the mobility suppression in LBSO films can be lifted by a simple vacuum annealing process. The oxygen vacancies generated from vacuum annealing reduced the thermal stability of LBSO films on MgO substrates, which increased their carrier concentrations and lateral grain sizes at elevated temperatures. As a result, the carrier mobilities were greatly improved, which does not occur after heat treatment in air. We report a factorial design experiment for the vacuum annealing of LBSO films on MgO substrates and discuss the implications of the results. Our findings expand our current knowledge on the point defect formation in epitaxial LBSO films and show that vacuum annealing is a powerful tool for enhancing the mobility values of LBSO films.
机译:宽带隙(E g 〜3.1 eV)La掺杂的BaSnO 3 (LBSO)作为透明氧化物半导体之一,由于其块状单晶显示出高的比重而引起了越来越多的关注。载流子浓度高(〜10 20 V ?1 s ?1 ) > cm ?3 )。因此,到目前为止,许多研究人员已经制造了LBSO外延膜,但是由于形成了晶格/结构缺陷,因此与单晶相比,可获得的载流子迁移率实质上较低。在这里我们报告说,可以通过简单的真空退火工艺来消除LBSO膜中的迁移率抑制。真空退火产生的氧空位降低了MgO衬底上LBSO膜的热稳定性,从而增加了它们在高温下的载流子浓度和横向晶粒尺寸。结果,大大提高了载体的迁移率,这在空气中进行热处理后不会发生。我们报告了对MgO衬底上的LBSO薄膜进行真空退火的析因设计实验,并讨论了结果的含义。我们的发现扩展了我们目前在外延LBSO膜中形成点缺陷的知识,并表明真空退火是增强LBSO膜迁移率值的有力工具。

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