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Origin of Mobility Suppression in La-doped BaSnO3 Films (Ⅱ)

机译:La掺杂BaSnO3薄膜中迁移抑制的起源(Ⅱ)

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摘要

As discussed in the part-Ⅰ abstract, La-doped BaSnO3 (BLSO, Pm-3m, α =4.115 A,Eg〜3.1eV) epitaxial films exhibit only 〜100 cm2 V1s1 though the single crystal exhibit very high mobility of 320 cm2 V-1s-1. The main origin of mobility suppression is considered to that doped La ions were not activated at around the film/substrate interfaces. In order to clarify the origin of La inactivation, we performed LAADF-STEM observations and EELS analyses (data not shown). We have clarified that oxygen concentration at around the BLSO film and substrate interface is lower than that in the bulk region. We have also detected 2+ valence state of Sn in the BLSO film by XAS. Since Sn2+ ions play not only as electron acceptor but also ionized impurity, mobility and carrier concentration suppression occurred simultaneously.
机译:如第一部分摘要所述,掺镧的BaSnO3(BLSO,Pm-3m,α= 4.115 A,Eg〜3.1eV)外延膜仅显示约100 cm2 V1s1,尽管单晶显示出非常高的迁移率320 cm2 V -1s-1。迁移率抑制的主要来源被认为是掺杂的La离子在薄膜/基底界面周围未被激活。为了阐明La失活的起源,我们进行了LAADF-STEM观察和EELS分析(数据未显示)。我们已经阐明,BLSO膜和衬底界面周围的氧浓度低于本体区域中的氧浓度。我们还通过XAS检测了BLSO膜中Sn的2+价态。由于Sn2 +离子不仅充当电子受体,而且充当离子化杂质,因此迁移率和载流子浓度抑制同时发生。

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