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Reversed Temperature-Dependent Propagation Delay Characteristics in Nanometer CMOS Circuits

机译:纳米CMOS电路中与温度有关的反向传播延迟特性

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摘要

The supply voltage to threshold voltage ratio is reduced with each new technology generation. The gate overdrive variation with temperature plays an increasingly important role in determining the speed characteristics of CMOS integrated circuits. The temperature-dependent propagation delay characteristics, as shown in this brief, will experience a complete reversal in the near future. Contrary to the older technology generations, the speed of circuits in a 45-nm CMOS technology is enhanced when the temperature is increased at the nominal supply voltage. Operating an integrated circuit at the prescribed nominal supply voltage is not preferable for reliable operation under temperature fluctuations. A design methodology based on optimizing the supply voltage for temperature-variation-insensitive circuit performance is proposed in this brief. The optimum supply voltage is 45% to 53% lower than the nominal supply voltage in a 180-nm CMOS technology. Alternatively, the optimum supply voltage is 15% to 35% higher than the nominal supply voltage in a 45-nm CMOS technology. The speed and energy tradeoffs in the supply voltage optimization technique are also presented
机译:每一代新技术都会降低电源电压与阈值电压之比。栅极过驱动随温度的变化在确定CMOS集成电路的速度特性中起着越来越重要的作用。如本摘要所示,取决于温度的传播延迟特性将在不久的将来完全逆转。与较早的技术相反,当温度在标称电源电压下升高时,采用45纳米CMOS技术的电路速度会提高。为了在温度波动下可靠地工作,在规定的标称电源电压下操作集成电路是不可取的。本文提出了一种基于优化电源电压的设计方法,以实现对温度变化不敏感的电路性能。最佳电源电压比180 nm CMOS技术的标称电源电压低45%至53%。另外,最佳电源电压比45 nm CMOS技术中的标称电源电压高15%至35%。还介绍了电源电压优化技术中的速度和能量折衷

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