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Leakage Power Characteristics of Dynamic Circuits in Nanometer CMOS Technologies

机译:纳米CMOS技术中动态电路的泄漏功率特性

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Temperature-dependent subthreshold and gate-oxide leakage power characteristics of domino logic circuits under the influence of process parameter variations are evaluated in this paper. Preferred input vectors and node voltage states that minimize the total leakage power consumption are identified at the lower and upper extremes of a typical die temperature spectrum. New low-leakage circuit design guidelines are presented based on the results. Significantly increased gate dielectric tunneling current, as described in this paper, dramatically changes the leakage power characteristics of dynamic circuits in deeply scaled nanometer CMOS technologies. Contrary to the previously published techniques, a charged dynamic-node voltage state with low inputs is preferred for reducing the total leakage power consumption in the most widely used types of single- and dual-threshold voltage domino gates, particularly at low die temperatures. Furthermore, leakage power savings provided by the dual-threshold voltage domino logic circuit techniques based on input gating are all together reduced due to the significance of gate dielectric tunneling in sub-45-nm CMOS technologies
机译:本文评估了多米诺逻辑电路在工艺参数变化的影响下与温度有关的亚阈值和栅极氧化物泄漏功率特性。在典型的芯片温度谱的最低和最高极限处,确定了使总泄漏功率消耗最小的优选输入矢量和节点电压状态。根据结果​​,提出了新的低泄漏电路设计指南。如本文所述,显着增加的栅极介电隧穿电流大大改变了深度缩放纳米CMOS技术中动态电路的泄漏功率特性。与先前发布的技术相反,低输入的带电动态节点电压状态对于降低最广泛使用的单阈值和双阈值电压多米诺类型中的总泄漏功耗尤为理想,尤其是在低裸片温度下。此外,由于栅极介电隧穿在亚45纳米CMOS技术中的重要性,基于输入门控的双阈值电压多米诺逻辑电路技术所提供的节省的泄漏功耗全部降低了。

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