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Evaluation Of Pure Tin Plated Copper Alloy Substrates For Tin Whiskers

机译:锡晶须纯锡镀铜合金基底的评估

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Purpose - The purpose of this paper is to present the results from work on a project aimed at evaluating six different copper alloy substrates coatedrnwith pure tin for tin whisker growth. The influence of intermetallic growth between the copper alloy substrate and the tin-plating on the growth of tinrnwhiskers has been investigated.rnDesign/methodology/approach - The experiment consisted of six substrates of different alloys of copper, plated with bright tin including copperrnberyllium, cartridge brass, phosphor bronze, Cu-Ni-Si "7025" and Cu-Ni-Sn "spinodal". The samples were mechanically stressed and then subjected torntemperature humidity storage conditions for 1,000 h. These samples were then evaluated for tin whisker growth and intermetallic layer thickness.rnFindings - Of the six samples five showed tin whisker growth. For these samples the intermetallic layer thickness has little effect on tin whiskerrngrowth. Sample with Cu-Ni-Sn "spinodal" alloy substrate showed very low whisker density and comparatively lower maximum whisker length than thernother tested substrate material.rnResearch limitations/implications - More samples per condition should be evaluated to bolster the conclusions. For the sample without tin whiskerrngrowth, holes on the surface of the plating were observed. The holes in the plating provide an opportunity for stress relaxation after the plating process.rnSince stress in the plating layer is low, tin whiskers are not formed on the sample surface.rnOriginality/value - The paper details the tin whisker growth on six tin plated copper substrate samples. The intermetallic layer thickness for each copperrnalloy substrate is calculated. The relationship between the intermetallic layer thickness and tin whisker growth for the six substrates are discussed.
机译:目的-本文的目的是介绍一个项目的结果,该项目旨在评估用纯锡涂覆锡晶须生长的六种不同的铜合金基底。研究了铜合金基底和镀锡之间的金属间生长对锡晶须生长的影响。设计/方法/方法-实验由六种不同的铜合金基底组成,镀了亮锡,包括铜铍,弹药筒黄铜,磷青铜,Cu-Ni-Si“ 7025”和Cu-Ni-Sn“尖晶石”。对样品进行机械应力处理,然后将其置于温度湿度储存条件下1000小时。然后评估这些样品的锡晶须生长和金属间层厚度。rn发现-在六个样品中,五个样品显示锡晶须生长。对于这些样品,金属间层的厚度对锡晶须生长几乎没有影响。具有Cu-Ni-Sn“尖晶石”合金基底的样品比其他测试的基底材料显示出非常低的晶须密度和相对较低的最大晶须长度。研究限制/意义-应评估每种条件下更多的样品以支持结论。对于没有锡晶须生长的样品,观察到镀层表面上的孔。镀层中的孔为镀层处理后的应力松弛提供了机会。rn由于镀层中的应力较低,因此在样品表面上不会形成锡晶须。rn原始值/值-本文详细介绍了六片镀锡后锡晶须的生长情况铜基板样品。计算每个铜合金基底的金属间层厚度。讨论了六个衬底的金属间层厚度与锡晶须生长之间的关系。

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