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Residual stress determination in thin films by X-ray diffraction and the widespread analytical practice applying a biaxial stress model: An outdated oversimplification?

机译:X射线衍射薄膜的残余应力测定及施用双轴应力模型的广泛分析实践:过时的过度简化?

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摘要

Compressive stresses are commonly desired in thin films and the stress state in layers and coatings is in general evaluated assuming a biaxial nature of stress. But how thin is thick enough, or how many atom layers are necessary until this model assumption fails and a hydrostatic term joins in? In order to provide an answer molybdenum has been magnetron sputtered on display glass in layer thicknesses from 100 nm up to 2000 nm and afterwards investigated by X-ray diffraction to determine the residual stress state in the [1 1 0] fiber-textured sputtered films. It will be demonstrated that the use of a biaxial stress model might only be justified for thin layers if at all.
机译:在薄膜中通常需要压缩应力,并且在粘附的双轴性质中,层和涂层中的应力状态通常是评估的。但足够厚,或者在这种模型假设失败和静水压术语加入之前是必要的厚度,或者有多少原子层?为了提供答案,钼已经在100nm的层厚度上溅射在展示玻璃上溅射,从100nm到2000nm,然后通过X射线衍射研究,以确定[110]纤维纹理溅射膜中的残余应力状态。将证明使用双轴应力模型的使用可能只适用于薄层,如果有的话。

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