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首页> 外文期刊>Applied Surface Science >Investigation of Ba_(0.6)Sr_(0.4)TiO_3 thick films by means of a novel THz-TDS approach
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Investigation of Ba_(0.6)Sr_(0.4)TiO_3 thick films by means of a novel THz-TDS approach

机译:新型THz-TDS方法研究Ba_(0.6)Sr_(0.4)TiO_3厚膜

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摘要

Ba0.6Sr0.4TiO3 (BST) ferroelectric thick films were grown on MgO(001) and Al2O3 (0 0 0 1) single-crystal substrates by using a pulsed laser deposition method. Structural, morphological, optical, and terahertz characterization of the BST films were performed by X-ray Diffraction, Atomic Force Microscopy, Spectroscopic Ellipsometry (SE), and Terahertz Time-Domain Spectroscopy (THz-TDS). Single-phase samples with strong preferred (1 1 1) orientation and surface roughness lower than 1.5% of their thicknesses have been obtained for both types of substrates. SE was employed to extract the thickness and optical properties by using a 3-layer optical model (substrate/thin film/roughness). The inferred refractive index @630 nm is around 2.05, while the optical interference is visible until 3.3 eV. The THz-TDS measurements in transmission set-up were carried out one after the other on substrates before and after the BST film deposition. The standard THz-TDS analysis of double-layer samples proved difficult to complete in the cases in which a thin or thick film is deposited on a much thicker substrate of known dielectric properties. However, we have been able to extract the complex dielectric permittivity in the THz domain for BST samples with thicknesses of few microns, by developing a specific procedure of data analysis.
机译:通过使用脉冲激光沉积方法,在MgO(001)和Al2O3(0 0 0 1)单晶衬底上生长Ba0.6Sr0.4TiO3(BST)铁电厚膜。 BST膜的结构,形态,光学和太赫兹表征是通过X射线衍射,原子力显微镜,光谱椭圆仪(SE)和太赫兹时域光谱(THz-TDS)进行的。对于这两种类型的基板,都已经获得了单相样品,该样品具有强烈的优选(1 1 1)取向并且表面粗糙度低于其厚度的1.5%。通过使用三层光学模型(基板/薄膜/粗糙度),采用SE提取厚度和光学特性。推断的折射率@ 630 nm约为2.05,而直到3.3 eV才可见光干涉。透射设置中的THz-TDS测量是在BST膜沉积之前和之后在基板上一个接一个地进行的。事实证明,如果在已知介电特性的厚得多的基板上沉积薄膜或厚膜,则很难完成双层样品的标准THz-TDS分析。但是,通过开发特定的数据分析程序,我们已经能够提取厚度为几微米的BST样品在THz域中的复介电常数。

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