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Etching processes of transferred and non-transferred multi-layer graphene in the presence of extreme UV, H_2O and H_2

机译:极端UV,H_2O和H_2存在下转移和未转移的多层石墨烯的蚀刻过程

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In this work we expose transferred multi-layer graphene (i.e. graphene separated from the substrate used for graphene growth and placed onto a carrier sample) to Extreme Ultraviolet light and water, in the presence of hydrogen. It is observed that graphene oxidizes by breaking down its aromatic structure into the enol form of 1,3-diketone. Furthermore, this oxidation is compared with studies on as-grown multi-layer graphene samples, which are shown to not oxidize. Our work shows that oxidation is most likely limited to a few layers of graphene at the interface between the graphene and the substrate onto which it is transferred. This is attributed to the presence of water, trapped during the transfer process, which is dissociated by secondary electrons from the substrate.
机译:在这项工作中,我们在氢气存在下,将转移的多层石墨烯(即从用于石墨烯生长的基材上分离出来的石墨烯,并置于载体样品上)暴露于极紫外光和水中。观察到石墨烯通过将其芳族结构分解成1,3-二酮的烯醇形式而氧化。此外,将这种氧化与对已生长的多层石墨烯样品的研究进行了比较,结果显示该样品未氧化。我们的工作表明,氧化极有可能仅限于石墨烯与转移到其上的基材之间的界面处的几层石墨烯。这归因于在转移过程中被捕集的水的存在,水被二次电子从基板上解离。

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