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Physical properties of rf-sputtered ZnS and ZnSe thin films used for double- heterojunction ZnS/ZnSe/CdTe photovoltaic structures

机译:用于双异质结ZnS / ZnSe / CdTe光伏结构的射频溅射ZnS和ZnSe薄膜的物理性质

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摘要

Polycrystalline ZnX (X=S, Se) and CdTe thin films were prepared by rf magnetron sputtering and by thermal vacuum evaporation (CdTe films), respectively. The structural properties were studied by X-ray diffraction (XRD), which revealed that ZnX films are polycrystalline with a marked (111) texture. After irradiation with protons crystallite sizes decreased while mechanical strains increased. Thicknesses of ZnX films and surface roughness have been measured by X-ray reflectometry (XRR) with thickness values between 58 nm and up to 163 nm and with surface roughness between 1.7 nm and 2.4 nm. Morphological investigations were made by scanning electron microscopy (SEM), drops - free surfaces with compact and uniform aspect being deposited. Absorption and transmission measurements were carried out for all samples deposited on optical glass substrates. Experimentally determined bandgap energies were between 2.31-2.75 eV for ZnSe layers, respectively, 3.10-3.65 eV for ZnS films. Optical transmissions in VIS-NIR regions are higher than 60% for both ZnSe and ZnS films. Glass/ITO/ZnS/ZnSe/CdTe/Cu:Au structures in superstrate configuration were produced by depositing CdTe absorber layers by thermal vacuum evaporation (TVE). Action spectra of the external quantum energy (EQE) and the current-voltage (I-V) characteristics in AM 1.5 conditions (the density power of the incident light is equal with 100 mW/cm(2)) corresponding for double-heterojunction ZnS/ZnSe/CdTe photovoltaic structures were investigated before and after irradiations with high energy protons (3 MeV).
机译:分别通过射频磁控溅射和热真空蒸发(CdTe薄膜)制备多晶ZnX(X = S,Se)和CdTe薄膜。通过X射线衍射(XRD)研究了结构性能,结果表明ZnX膜是具有明显(111)织构的多晶。质子辐照后,微晶尺寸减小,而机械应变增大。 ZnX膜的厚度和表面粗糙度已通过X射线反射法(XRR)进行了测量,厚度值在58 nm至163 nm之间,表面粗糙度在1.7 nm至2.4 nm之间。通过扫描电子显微镜(SEM)进行形态学研究,滴落-沉积具有紧密和均匀外观的自由表面。对沉积在光学玻璃基板上的所有样品进行吸收和透射率测量。实验确定的带隙能量对于ZnSe层分别在2.31-2.75 eV之间,对于ZnS膜为3.10-3.65 eV。 ZnSe和ZnS薄膜在VIS-NIR区域的光透射率均高于60%。通过热真空蒸发(TVE)沉积CdTe吸收层来生产玻璃/ ITO / ZnS / ZnSe / CdTe / Cu:Au上层结构。对应于双异质结ZnS / ZnSe的AM 1.5条件(入射光的密度功率等于100 mW / cm(2))的外部量子能(EQE)和电流-电压(IV)特性的作用谱/ CdTe光伏结构在高能质子(3 MeV)照射之前和之后进行了研究。

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  • 来源
    《Applied Surface Science》 |2019年第1期|831-839|共9页
  • 作者单位

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania;

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania;

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania;

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania;

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania;

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania;

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania;

    Univ Bucharest, Fac Phys, 405 Atomistilor St,POB MG 11, Magurele 077125, Ilfov, Romania|Acad Romanian Scientists, Bucharest 030167, Romania;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ZnS; ZnSe; CdTe; rf-Magnetron sputtering; Protons irradiation;

    机译:ZnS;ZnSe;CdTe;r-磁控溅射;质子辐照;

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