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Physical properties of rf-sputtered ZnS and ZnSe thin films used for double- heterojunction ZnS/ZnSe/CdTe photovoltaic structures

机译:用于双异质结ZnS / ZnSE / CdTe光伏结构的RF溅射ZnS和ZnSe薄膜的物理性质

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摘要

Polycrystalline ZnX (X=S, Se) and CdTe thin films were prepared by rf magnetron sputtering and by thermal vacuum evaporation (CdTe films), respectively. The structural properties were studied by X-ray diffraction (XRD), which revealed that ZnX films are polycrystalline with a marked (111) texture. After irradiation with protons crystallite sizes decreased while mechanical strains increased. Thicknesses of ZnX films and surface roughness have been measured by X-ray reflectometry (XRR) with thickness values between 58 nm and up to 163 nm and with surface roughness between 1.7 nm and 2.4 nm. Morphological investigations were made by scanning electron microscopy (SEM), drops - free surfaces with compact and uniform aspect being deposited. Absorption and transmission measurements were carried out for all samples deposited on optical glass substrates. Experimentally determined bandgap energies were between 2.31-2.75 eV for ZnSe layers, respectively, 3.10-3.65 eV for ZnS films. Optical transmissions in VIS-NIR regions are higher than 60% for both ZnSe and ZnS films. Glass/ITO/ZnS/ZnSe/CdTe/Cu:Au structures in superstrate configuration were produced by depositing CdTe absorber layers by thermal vacuum evaporation (TVE). Action spectra of the external quantum energy (EQE) and the current-voltage (I-V) characteristics in AM 1.5 conditions (the density power of the incident light is equal with 100 mW/cm(2)) corresponding for double-heterojunction ZnS/ZnSe/CdTe photovoltaic structures were investigated before and after irradiations with high energy protons (3 MeV).
机译:通过RF磁控溅射和通过热真空蒸发(CDTE膜)制备多晶ZnX(X = S,SE)和CDTE薄膜。通过X射线衍射(XRD)研究了结构性质,其显示Znx膜是具有标记(111)纹理的多晶。与质子照射后而机械应变增加晶粒尺寸减小。通过X射线反射测量(XRR)测量ZnX膜和表面粗糙度的厚度,厚度值在58nm和高达163nm之间,并且表面粗糙度在1.7nm和2.4nm之间。通过扫描电子显微镜(SEM),无紧凑且均匀的方面进行形态研究。对沉积在光学玻璃基板上的所有样品进行吸收和透射测量。实验确定的带隙能量分别为ZnSE层的2.31-2.75eV,3.10-3.65 eV用于ZNS薄膜。对于ZnSE和ZnS膜,Vis-Nir区域中的光学传输高于60%。玻璃/ ITO / ZnS / ZnSe / Cdte / Cu:通过热真空蒸发(TVE)沉积CDTE吸收层来制备超晶体配置中的Au结构。外部量子能量(EQE)的动作光谱和AM 1.5条件中的电流 - 电压(IV)特性(入射光的密度功率等于100mW / cm(2)),对应双异质结ZnS / ZnSe / CdTe光伏结构在用高能质子(3MeV)的照射之前和之后进行了研究。

著录项

  • 来源
    《Applied Surface Science》 |2019年第1期|831-839|共9页
  • 作者单位

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania;

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania;

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania;

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania;

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania;

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania;

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania;

    Univ Bucharest Fac Phys 405 Atomistilor St POB MG 11 Magurele 077125 Ilfov Romania|Acad Romanian Scientists Bucharest 030167 Romania;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ZnS; ZnSe; CdTe; rf-Magnetron sputtering; Protons irradiation;

    机译:ZnS;ZnSe;CDTE;RF-磁控溅射;质子辐照;

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